Metal-Mesh Lithography

Metal hierarchical patterning by direct nanoimprint lithography

Three-dimensional hierarchical patterning of metals is of paramount importance in diverse fields involving photonics, controlling surface wettability and wearable electronics. Conventionally, this type of structuring is tedious and usually involves layer-by-layer lithographic patterning. Here, we describe a simple process of direct nanoimprint lithography using palladium benzylthiolate, a versa...

Metal Particle-Surface System for Plasmonic Lithography

Analytical model for metal–insulator–metal mesh waveguide architectures

Metal–insulator–metal (MIM) waveguide mesh structures utilize X-junctions as power distribution elements to create interference and feedback effects, thereby providing rich device functionality. We present a generalized analytical model for MIM mesh structures by incorporating a modified characteristic impedance model for MIM junctions into the scatteringmatrix formalism. Themodified impedancem...

Metal nanoparticle arrays for near field optical lithography

We have recently proposed a new approach to optical lithography that could be used to replicate arrays of metal nanoparticles using broad beam illumination with visible light and standard photoresist. The method relies on resonant excitation of the surface plasmon oscillation in the nanoparticles. When excited at the surface plasmon frequency, a resonantly enhanced dipole field builds up around...

Solution-processed metal nanowire mesh transparent electrodes.

Transparent conductive electrodes are important components of thin-film solar cells, light-emitting diodes, and many display technologies. Doped metal oxides are commonly used, but their optical transparency is limited for films with a low sheet resistance. Furthermore, they are prone to cracking when deposited on flexible substrates, are costly, and require a high-temperature step for the best...